JPH03621B2 - - Google Patents

Info

Publication number
JPH03621B2
JPH03621B2 JP58170024A JP17002483A JPH03621B2 JP H03621 B2 JPH03621 B2 JP H03621B2 JP 58170024 A JP58170024 A JP 58170024A JP 17002483 A JP17002483 A JP 17002483A JP H03621 B2 JPH03621 B2 JP H03621B2
Authority
JP
Japan
Prior art keywords
plate
holding frame
plate material
processing device
discharging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58170024A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6061753A (ja
Inventor
Masafumi Ogura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ODOKO SEISAKUSHO KK
Original Assignee
ODOKO SEISAKUSHO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ODOKO SEISAKUSHO KK filed Critical ODOKO SEISAKUSHO KK
Priority to JP58170024A priority Critical patent/JPS6061753A/ja
Publication of JPS6061753A publication Critical patent/JPS6061753A/ja
Publication of JPH03621B2 publication Critical patent/JPH03621B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58170024A 1983-09-14 1983-09-14 自動給排版装置 Granted JPS6061753A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58170024A JPS6061753A (ja) 1983-09-14 1983-09-14 自動給排版装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58170024A JPS6061753A (ja) 1983-09-14 1983-09-14 自動給排版装置

Publications (2)

Publication Number Publication Date
JPS6061753A JPS6061753A (ja) 1985-04-09
JPH03621B2 true JPH03621B2 (en]) 1991-01-08

Family

ID=15897181

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58170024A Granted JPS6061753A (ja) 1983-09-14 1983-09-14 自動給排版装置

Country Status (1)

Country Link
JP (1) JPS6061753A (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011109819A3 (en) * 2010-03-05 2012-01-19 Nabes,Llc Binocular apparatus and system

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62220957A (ja) * 1986-03-20 1987-09-29 Dainippon Screen Mfg Co Ltd 傾斜型殖版機における感光材料の給排装置
JP2823737B2 (ja) * 1992-05-20 1998-11-11 大日本スクリーン製造株式会社 感光材料供給排出装置及び感光材料受渡し装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011109819A3 (en) * 2010-03-05 2012-01-19 Nabes,Llc Binocular apparatus and system

Also Published As

Publication number Publication date
JPS6061753A (ja) 1985-04-09

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